会議情報
IITC 2024: IEEE International Interconnect Technology Conference
https://iitc-conference.org/
提出日:
2024-02-12
通知日:
会議日:
2024-06-03
場所:
San Jose, California, USA
年:
27
閲覧: 10359   追跡: 0   出席: 0

論文募集
The 27th edition of the International Interconnect Technology Conference (IITC) will be held June 3-6, 2024 in San Jose, California. Authors are encouraged to submit their original work describing innovative research and development in the critically important field of on-chip interconnects. The conference seeks papers on all aspects of BEOL/MOL interconnects and metallization, including design, unit process, integration and reliability. The deadline for submission of abstracts is February 12, 2024.

IITC is sponsored by the IEEE Electron Devices Society as the premier conference for interconnect technology devoted to leading-edge research in the field of advanced metallization and 3D integration for ULSI IC applications. The conference seeks papers on all aspects of BEOL/MOL interconnects and metallization, including design, unit process, integration and reliability.

Applications of Interest

    Advanced interconnects: low-k interconnects, optical, wireless, and carbon-based interconnects, Airgap, 1D/2D interconnects, beyond Cu…
    Emerging BEOL Integration flows such as semi-damascene
    3D integration & packaging concerns: Wafer-to-Wafer/Chip-to-Wafer bonding, RDL’s and Interposers, Through Si Via, Non-destructive, high throughput methods to identify defects, backside power distribution network (BSPDN), thermal management
    Contacts on MOS devices: Silicide, III-V, 2D materials…
    Memory architecture: CBRAM, PCRAM, ReRAM, MRAM, FeRAM, DRAM, 3DNAND…
    Novel System and Emerging Technology: Energy harvesting, brain-inspired computing…
    Novel Form Factors: flexible electronics, wearables…

Topics of Interest

    Process integration, advanced patterning for MOL/BEOL
    Materials and Unit Processes (Dielectrics, metals, barriers, Wet, CMP, PVD, CVD, ALD, selective deposition/SAMs, patterning, advanced cleaning and surface treatment)
    Reliability and Failure analysis, characterization, techniques, and methods
    Advanced material/process characterization, system-technology & design-technology co-optimization, and modelling techniques

Abstract Information

Abstracts must be no more than 3 pages in length. Details of abstract submission, including a template will be available shortly when the submission site is available. Submissions will be reviewed for acceptance as an oral presentation or poster. Accepted abstracts will be published digitally by IEEE as IITC Conference Proceedings without further changes.
最終更新 Dou Sun 2023-12-03
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完全な名前インパクト ・ ファクター出版社
Journal of Internet Technology0.481Taiwan Academic Network
Journal of Object TechnologyEtH Zurich
International Journal of Speech Technology Springer
Indonesian Journal of Science and TechnologyUniversitas Pendidikan Indonesia
Journal of Computer Science and Technology0.475SCIENCE PRESS
Law, Innovation and TechnologyTaylor & Francis
ACM Transactions on Intelligent Systems and TechnologyACM
Physics of Life Reviews11.02Elsevier
Information and Software Technology2.730Elsevier
Language Learning & Technology2.571University of Hawaii Press
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